MPEP 2100 譯文 - 專利

不好意思最近佔了很多版面 敬請原諒

聽了C大跟V兄的建議. 開始對MPEP 2100下手.

前菜是索引 分三天貼出

請各位先輩以嚴格的標準來審視 有請多多指教批評

^)^

2100 Patentability
可專利性

2126 Availability of a Document as a "Patent" for Purposes of Rejection Under
35 U.S.C. 102 (a), (b), and (d) [R-5]
將"專利文件"用作 35 U.S.C. 102 (a), (b), and (d)核駁的可行性

2126.01 Date of Availability of a Patent as a Reference [R-3]
專利文件可被應用為引証之日期

2126.02 Scope of Reference's Disclosure Which Can Be Used to Reject Claims
When the Reference Is a "Patent" but Not a "Publication"
當引證資料係一"專利文件" 而非一 "刊物"時，
該"專利文件"中可被用來核駁專利申請專利範圍(claim)之範圍

2127 Domestic and Foreign Patent Applications as Prior Art [R-6]
以本國及外國專利申請文件為先前技術

2128 "Printed Publications" as Prior Art [R-5]
利用"印刷刊物"為先前技術

2128.01 Level of Public Accessibility Required [R-3]
對大眾是否可取得之規定的程度要求

2128.02 Date Publication Is Available as a Reference
附有日期的刊物可被當作為一引證

2129 Admissions as Prior Art [R-6]
以口供作為先前技藝

2131 Anticipation - Application of 35 U.S.C. 102 (a), (b), and (e)
合理預期 - 根據 35 U.S.C. 102 (a), (b) 及 (e) 所為之申請案

2131.01 Multiple Reference 35 U.S.C. 102 Rejections
同時引用多個引證以為35 U.S.C. 102之核駁

2131.02 Genus-Species Situations [R-6]
基因-物種之情況

2131.03 Anticipation of Ranges [R-6]
範圍的合理預期

2131.04 Secondary Considerations
次要考量因素(二次要因)

2131.05 Nonanalogous or Disparaging Prior Art [R-5]
不同技術領域 或 對申請案具有負面影響(?)的先前技術

2132 35 U.S.C. 102(a)
2132.01 Publications as 35 U.S.C. 102 (a) Prior Art
35 U.S.C. 102(a)中所記載之先前技藝

2133 35 U.S.C. 102(b)
2133.01 Rejections of Continuation-In-Part (CIP) Applications
部份延續申請案之核駁

2133.02 Rejections Based on Publications and Patents
根據刊物及專利而為之核駁

2133.03 Rejections Based on "Public Use" or "On Sale" [R-5]
根據"己為公開使用"或"己為銷售"而為之核駁

2133.03(a) "Public Use" [R-5]
"己為公開使用"

2133.03(b) "On Sale" [R-5]
"己為銷售"

2133.03(c) The "Invention" [R-5]
"發明"一詞

2133.03(d) "In This Country"
"在這國家"(美國)一詞

2133.03(e) Permitted Activity; Experimental Use [R-3]
已被准許的活動；實驗性使用

2133.03(e)(1) Commercial Exploitation
商業上的開發使用

2133.03(e)(2) Intent
意圖

2133.03(e)(3) "Completeness" of the Invention [R-3]
發明的"完整性"

2133.03(e)(4) Factors Indicative of an Experimental Purpose [R-5]
用於判斷是否實驗上應用的要件之組成

2133.03(e)(5) Experimentation and Degree of Supervision and Control [R-5]
試驗及其監督和控制之程度

2133.03(e)(6) Permitted Experimental Activity and Testing [R-3]
被核許的實驗活動及測試

2133.03(e)(7) Activity of an Independent Third Party Inventor
獨立第三人發明人的行為

2134 35 U.S.C. 102(c)

2135 35 U.S.C. 102(d)
2135.01 The Four Requirements of 35 U.S.C. 102(d)
35 U.S.C. 102(d)的四個規範

2136 35 U.S.C. 102(e) [R-3]
2136.01 Status of U.S. Application as a Reference [R-3]
以美國申請案 來作為引證之條件

2136.02 Content of the Prior Art Available Against the Claims [R-3]
先前技術可用以對抗申請專利範圍的內容

2136.03 Critical Reference Date [R-6]
引證鑑定日期

2136.04 Different Inventive Entity; Meaning of "By Another"
不同的申請個體；"被他人"一詞的意義

2136.05 Overcoming a Rejection Under 35 U.S.C. 102(e)
克服35 U.S.C. 102(e)核駁(的條件)

2137 35 U.S.C. 102(f)
2137.01 Inventorship [R-3]
適格發明人

2137.02 Applicability of 35 U.S.C. 103(c) [R-3]
35 U.S.C. 103(c)的可申請性

2138 35 U.S.C. 102(g) [R-3]
2138.01 Interference Practice [R-3]
實施衝突

2138.02 "The Invention Was Made in This Country"
"此發明係於本國完成"一詞

2138.03 "By Another Who Has Not Abandoned, Suppressed, or Concealed It"
"被 沒有被拋棄、禁止阪表或隱蔽的他人"

2138.04 "Conception" [R-5]
"概念"一詞

2138.05 "Reduction to Practice" [R-5]
"付諸實現"一詞

2138.06 "Reasonable diligence"
"付出合理的努力"一詞

以上
--