Intel 到底怎麼了? Part 2 - 股票

※ 引述《giorno78 (天晴)》之銘言：
: 作者: KotoriCute (Lovelive!) 看板: PC_Shopping
: 標題: [閒聊] Intel 到底怎麼了? Part 2
: 時間: Wed Jul 29 19:42:41 2020
:
: https://www.facebook.com/RDinPortland/posts/3187666937992352
:
: Intel 到底怎麼了? Part 2
:
: Intel為什麼會找上台積電代工? 這不是一個突然的決定, 一切都是有跡可循的, 冰凍三
: 尺非一日之寒.
:

: → pp520 : 快快 我想看 Part 3 07/29 20:59
: → pp520 : 問一下 chia hong 是誰 ? 07/29 21:00


有人問 Chia-Hong 是誰，應該是下面這一位，他是第一個台大畢業的 Intel Fellow。

http://www.che.ntu.edu.tw/ntuche/cht/bulletin_content.php?id=393

2010年獲選為 Intel Fellow 時台大化工官網上的簡介：

簡嘉宏博士 畢業於國立台灣大學化學工程學系(1982)，1986年獲國立台灣大學工商管理
碩士，分別於1988年與1991年 獲得美國威斯康辛大學麥迪遜校區材料科學碩士與博士學
位。目前是英特爾院士，英特爾公司SoC積體電路技術集團的技術和製造部門負責人，為
第一位來自國立台灣大學的英特爾院士(intel fellow)。

簡嘉宏博士是英特爾研究員與SoC積體電路技術集團的技術和製造部門負責人。在這個職
位上，簡博士管理英特爾公司所有SoC產品的32奈米和22奈米製程技術 ，包括超低功耗的
移動網絡設備，netbook處理器，消耗性電子產品， 嵌入式產品，無線通信應用和 芯片
組 /圖形處理器。

簡博士自從 1991年加盟英特爾後，擁有多項技術及身居0.8um， 0.55μm，0.35微米，
0.25微米，0.18微米，0.13微米，90奈米，65奈米，45奈米，32奈米波特蘭技術發展
(Portland Technology Development)和現在 22奈米先進的CMOS技術發展的管理職位。他
是快速熱的處理（RTP）的和先進的矽沉積（ASD）的小組負責人， 工作目標在發展新型
矽化物技術，先進的gate oxide processes ，源/漏樞紐工程和磊晶矽鍺 應變矽技術。
他帶領的團隊，率先整合 新矽化物材料，包括引入鈦（0.55μm）， 鈷（0.18）和鎳進
入basic logic CMOS處理器。他亦是 90納米交結積體電路部門經理，和他的團隊是第一
個 在工業界成功整合low-k ILD材料應用於高功能微處理器者。他同時還是 Intel®
Atom™ processor 禆ased low-power products(英特爾 ®凌動™處理器二叉樹低功耗
產品)中65奈米低功耗芯片製造技術與45奈米SoC製造技術項目經理，此項產品針對有效利
用創新的high-k/metal gate技術於SoC領先應用於工業界。

在半導體製程與積體電路領域中，簡博士擁有 37項美國專利 。他已發表超過 40篇與
CMOS加工技術有關的技術 論文。獲得3項 英特爾成就獎，並在2008年獲頒威斯康辛大學
麥迪遜分校工程學院傑出成就獎。


http://gipo.ntu.edu.tw/p5news-3-detail.php?sn=8828

2018年回台大光電演講時的簡介(此時已是Intel Senior Fellow, 2017年時獲選 IEEE Fellow, 當時擔任 Intel HPC Director)。

Chia-Hong Jan is an Intel Senior Fellow and the Director of High-Performance
Computing (HPC) and System on Chip (SoC) technology integration for the
Technology and Manufacturing Group at Intel Corporation. He is responsible
for Intel’s most advanced process technology development for next-generation
CPUs used in high-performance and SoC product segments, including data
center, cloud server, desktop, laptop, notebook, tablet, smartphone,
application-specific integrated circuits, field-programmable gate arrays and
wireless communication products.
The Institute of Electrical and Electronics Engineers (IEEE) has named
Chia-Hong Jan) among its 2017 class of fellows. The honor recognizes Jan for
his leadership in developing low power logic technologies for System-on-Chip
(SoC).
Jan holds a bachelor’s degree in chemical engineering and an MBA degree from
National Taiwan University. He also earned a master’s degree and Ph.D. in
materials science from the University of Wisconsin-Madison.
Since joining Intel in 1991, Jan has held various technical and leadership
roles in the Portland Technology Development organization related to the
development of 0.8μm, 0.55μm, 0.35μm, 0.25μm, 0.18μm, 0.13μm, 90nm,
65nm, 45nm, 32nm, 22nm and 14nm advanced CMOS technology. He was the group
leader for rapid thermal processing and advanced silicon deposition
engineering, working on the development of novel salicide technology,
advanced gate oxide processes, source and drain junction engineering, and epi
SiGe technology for strained silicon. As the manager of 90nm interconnect
integration, he led the team credited with being the first in the industry to
successfully integrate low-k ILD materials for high-performance
microprocessors. He was also the program manager for the 65nm low-power
chipset process technology, and for 45nm, 32nm, 22nm and 14 nm SoC process
technology for Intel® Atom™ processor–based low-power products, including
micro-servers, tablets and smartphones, and chipsets, wireless and FPGA
products. Jan was promoted to Intel Senior Fellow, the highest technical
position at intel, in 2016.
Jan holds more than 88 patents worldwide in the field of semiconductor
manufacturing process and integration. He has authored/co-authored more than
40 technical papers related to CMOS processing technology. Jan has received
three Intel Achievement Awards (IAA) and was honored with the UW-Madison
College of Engineering’s Distinguished Achievement Award in 2008.




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